Pre-/Post-Treatment and Duplex Technology (G4-MoM)
Monday, Apr 27 2020 10:00AM, Room Pacific Salon 2
Moderated by: Heidrun Klostermann, Fraunhofer FEP; Hiroyuki Kousaka, Gifu University
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
10:20 AMG4-MoM-2Notable Difference between Rapid-Thermal and Microwave Annealing on Ge pMOSFETs
10:40 AMG4-MoM-3Effect of Annealing Environment on Performance of InWZnO CBRAM
11:00 AMG4-MoM-4Plasma Pretreatment of Small Parts in Bulk Vacuum Coating
11:20 AMG4-MoM-5Comprehensive Characterization of Surface Modification Mechanisms in Boron Nitride Films Prepared by a Reactive Plasma-assisted Coating Technique
1
Page size:
 4 items in 1 pages