Functional Oxide and Oxynitride Coatings II (F4-2-WeA)
Wednesday, May 22 2019 2:00PM, Room Pacific Salon 6-7
Moderated by: Anders Eriksson, Oerlikon Balzers, Oerlikon Surface Solutions AG; Marcus Hans, RWTH Aachen University; Jörg Patscheider, Evatec AG
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
3:00 PMF4-2-WeA-4Structural, Optical and Electrochromic Properties of Nanocrystalline WO3 Thin Films
3:20 PMF4-2-WeA-5Structure, Mechanical Characteristics and Thermal Stability of HS-PVD (Al,Cr)2O3 Coatings
3:40 PMF4-2-WeA-6Reactive HiPIMS Deposition of γ -Al2O3 Thin Films using Transition Metal Doped Al Targets
4:00 PMF4-2-WeA-7Influence of V Content on Phase Evolution and Thermal Stability of Reactive Pulsed DC Magnetron Sputtered (Al,V)2O3
4:20 PMF4-2-WeA-8Al Vacancies in Wurtzite Al-(Si-)(O-)N: Theory and Experimental Assessment
4:40 PMF4-2-WeA-9Thermal Atomic Layer Etching of Oxide and Nitride Thin Films
5:20 PMF4-2-WeA-11Growth and Characterization ALD Films with a new Continuous Flow Process
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