HiPIMS, Pulsed Plasmas and Energetic Deposition (F2-3-)
Tuesday, Apr 24 2018 8:00AM, Room San Diego
Moderated by: Tiberiu Minea, Université Paris-Sud; Jon Tomas Gudmundsson, University of Iceland
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
Logon for Personal Schedule SchedulePaper #Invited TalkTitle
8:00 AMF2-3-1Ultra-thick CrN/AlN Superlattice Coatings Deposited by a Combination of Plasma Enhanced Magnetron Sputtering and High Power Impulse Magnetron Sputtering
8:20 AMF2-3-2Deposition of DLC Coatings by HIPIMS to Arc Mixed Mode
8:40 AMF2-3-3Performance Improvements of Tungsten and Zinc Doped Indium Oxide Thin Film Transistor by Fluorine Based Mixing Plasma Treatment with a High-K Gate Dielectric
9:00 AMF2-3-4Effect Of Craters Formation On Deep Hardening Under Pulsed Electron Beam Treatment
9:20 AMF2-3-5Mechanical Property Evaluation of ZrCN Films Deposited by a Hybrid Superimposed High Power Impulse- Middle Frequency Sputtering System
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