HiPIMS, Pulsed Plasmas and Energetic Deposition II (F2-2-ThA)
Thursday, May 23 2019 1:20PM, Room Pacific Salon 6-7
Moderated by: Jon Tomas Gudmundsson, University of Iceland; Tiberiu Minea, LPGP, Université Paris-Sud, Orsay, France
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
1:40 PMF2-2-ThA-2Pulsed Cathodic Arc for Deposition of ta-C and TiSiCN Films
2:00 PMF2-2-ThA-3HiPIMS Deposition of W Thin Films
2:20 PMF2-2-ThA-4Study and Development of Thermochromic VO2 Thin Films Deposited by HiPIMS
2:40 PMF2-2-ThA-5A Paradigm Shift in Thin Film Growth by Magnetron Sputtering: from Gas-ion to Metal-ion-controlled Irradiation
3:20 PMF2-2-ThA-7Thermal Stability of Protective Layers Comprising Nitrogen Expanded Phases on Fe-Cr-Ni Alloys
3:40 PMF2-2-ThA-8In Vitro and In Vivo Biocompatibility Evaluation of Zr-Ti-Si and Fe-Zr-Nb Thin Film Metallic Glasses
4:00 PMF2-2-ThA-9Microstructural and Tribological Properties of Sputtered AlCrSiWN Films Deposited with Segmented Powder Metallurgic Target Materials
4:20 PMF2-2-ThA-10Linking an Atmospheric-pressured Arc Reactor to a Magnetron Sputter Device to Synthesize Novel Nanostructured Thin Films
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