HiPIMS, Pulsed Plasmas and Energetic Deposition (F2-2-)
Monday, Apr 23 2018 1:30PM, Room San Diego
Moderated by: Tiberiu Minea, Université Paris-Sud; Jon Tomas Gudmundsson, University of Iceland
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
Logon for Personal Schedule SchedulePaper #Invited TalkTitle
1:30 PMF2-2-1Effect of Bias Voltage during Deposition by Deep Oscillation Magnetron Sputtering of AlN Films for Acoustic Biosensors
1:50 PMF2-2-2Modification of Niobium Surface Properties by High-temperature Nitrogen Plasma based Ion Implantation Aiming Aerospace Applications
2:10 PMF2-2-3High-Power Impulse Magnetron Sputtering Coatings for Extreme Environments
2:30 PMF2-2-4Reactive High-power Impulse Magnetron Sputtering of Al-O-N Films with Tunable Composition and Properties
2:50 PMF2-2-5Fabrication of Ti BC N Coatings using a Superimposed HiPIMS and MF Deposition System
3:10 PMF2-2-6Effect of Peak Current on the Ti-Cu Thin Film Deposition by High Power Impulse Magnetron Sputter Deposition
3:30 PMF2-2-7Deposition of Ag-Cu Thin Film on Flexible Substrate using High Power Impulse Magnetron Sputtering
3:50 PMF2-2-8Preparation of Anatase TiO2 Thin Films by Reactive HiPIMS
4:10 PMF2-2-9Vapor Phase Nanoparticle Synthesis, Guiding and Self-assembly
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 9 items in 1 pages