HiPIMS, Pulsed Plasmas and Energetic Deposition I (F2-1-ThM)
Thursday, May 23 2019 8:00AM, Room Pacific Salon 6-7
Moderated by: Jon Tomas Gudmundsson, University of Iceland; Tiberiu Minea, LPGP, Université Paris-Sud, Orsay, France
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
8:40 AMF2-1-ThM-3Recent Insights into HiPIMS Physics via Coherent and Incoherent Thomson Scattering
9:20 AMF2-1-ThM-5Process Gas Rarefaction and Other Transport Phenomena in High Power Impulse Magnetron Sputtering Discharges Studied by Particle Simulations
9:40 AMF2-1-ThM-6Insight on the Sputtered Material in HiPIMS by 2D PIC-MCC Modeling
10:00 AMF2-1-ThM-7Spoke Formation in Large Scale Rectangular Magnetrons
10:20 AMF2-1-ThM-8The Use of Bipolar-HiPIMS for the Design of Ion Energies in Thin Film Growth
10:40 AMF2-1-ThM-9Latest Developments in HIPIMS with Positive Pulsing
11:00 AMF2-1-ThM-10HIPIMS- Advantages of a Positive Kick Pulse
11:20 AMF2-1-ThM-11Plasma Parameter Determination in a HiPIMS Discharge Using Laser Thomson Scattering
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