HiPIMS, Pulsed Plasmas and Energetic Deposition (F2-1-)
Monday, Apr 23 2018 10:00AM, Room San Diego
Moderated by: Tiberiu Minea, Université Paris-Sud; Jon Tomas Gudmundsson, University of Iceland
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
Logon for Personal Schedule SchedulePaper #Invited TalkTitle
10:00 AMF2-1-1On Recycling in High Power Impulse Sputtering Magnetrons
10:20 AMF2-1-2Electron Density at the Sheath Edge of a HiPIMS Plasma
10:40 AMF2-1-3Spatially Resolved Investigation of Transport and Redeposition Processes during HiPIMS by Means of Optical Diagnostics and In-vacuum XPS Analysis of Magnetron Targets
11:00 AMF2-1-4Time-resolved Ion Energy and Charge Distributions in Pulsed Cathodic Arc Plasmas of Nb-Al Cathodes in High Vacuum.
11:20 AMF2-1-5Investigations on the Substrate Bias Influence on Reactive High Performance Plasmas
11:40 AMF2-1-6The Impact of a Positive Pulse in HIPIMS Films
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