HiPIMS, Pulsed Plasmas and Energetic Deposition II (B8-2-TuA)
Tuesday, Apr 28 2020 1:40PM, Room California
Moderated by: Jon Tomas Gudmundsson, University of Iceland; Daniel Lundin, Linköping University
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
1:40 PMB8-2-TuA-1Optimizing Ionization and Deposition Rate in High Power Impulse Magnetron Sputtering
2:20 PMB8-2-TuA-3Dynamics of the Titanium Ground State Atoms and Ions in HiPIMS Discharge
2:40 PMB8-2-TuA-4Self-Organization of Plasma in RF and DC Magnetron Sputtering Discharges
3:00 PMB8-2-TuA-5Understanding and Influencing the Energy Delivered to the Film in Bipolar HiPIMS
4:00 PMB8-2-TuA-8The Use of HiPIMS with Positive Pulses to Tailor Film Ion Assistance and the Resulting Microstructural Properties
4:20 PMB8-2-TuA-9Reversed Voltage as Deposition Rate Buster
4:40 PMB8-2-TuA-10Evolution of Ionization Fraction of Sputtered Species in Standard, Multi-pulse and Reactive HiPIMS
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