CVD Coatings and Technologies I (B2-1-ThA)
Thursday, May 23 2019 1:20PM, Room Golden West
Moderated by: Kazunori Koga, Kyushu University; Francis Maury, CIRIMAT
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
1:20 PMB2-1-ThA-1Impact of HfO2 as a Buffer Layer on the Electrical and Ferroelectric Memory Characteristics of Metal/Ferroelectric/High-K/Semiconductor Gate Stack for Nonvolatile Memory Applications
1:40 PMB2-1-ThA-2Studies on Properties and Cutting Performance of Al-rich AlTiN Coating with Controlled Orientation via LP-CVD
2:00 PMB2-1-ThA-3Effects of Al Content and Growth Orientation on Mechanical Properties of AlTiN Coatings Prepared by CVD Method
2:20 PMB2-1-ThA-4Thermal Crack Network Formation in CVD TiCN/α-Al2O3 Coatings
2:40 PMB2-1-ThA-5Nanostructure of Textured CVD TiAlN
3:00 PMB2-1-ThA-6Structural and Piezoelectric Properties of Chemical Vapor Deposited AlN Films on Metallic Substrates
3:20 PMB2-1-ThA-7Aluminum Nitride Based Coatings for High Temperature Solar Receiver Systems
3:40 PMB2-1-ThA-8Residual Stress and Quantitative Texture of CVD Al2O3 Coatings
4:00 PMB2-1-ThA-9Gas Source Chemical Vapor Deposition of Wafer-scale Mono- and few-layer MX2 (M=W or Mo and X=S or Se) and Their Alloys
4:40 PMB2-1-ThA-11The Effect of Dopants and Bilayer Period on Microstructure and Mechanical Properties of CVD Ti(B,C)N Hard Coatings
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